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SucopeiaSemicon Solutions

Photoresist monomers, photoacid generators and formulation additives for advanced lithography.

Semiconductor Materials

A complete lithography materials toolbox — fluorinated resist monomers, ionic and non-ionic photoacid generators, resist additives and CMP chemistry — engineered for chemically amplified resists from i-line and KrF/ArF deep-UV through EUV patterning.

Low metal ion contentBatch-to-batch consistencyi-line to EUV coverageFormulation-ready purity

21 products

Photoresist MonomersPhotoacid GeneratorsPhotoresist AdditivesCMP Additives

Photoacid Generators

8 products
Photoacid Generators

Oxime-Sulfonate Photoacid Generator

SCP-PG-201

Chemistry Class
Non-ionic O-arylsulfonyl oxime PAG
Key Applications
Non-ionic PAG systemsDUV / i-line resistsLow-outgassing formulations
Electronic Grade (Low Metal Ion)
Photoacid Generators

Imide-Sulfonate Photoacid Generator

SCP-PG-202

Chemistry Class
N-sulfonyloxyimide (non-ionic), perfluoroalkyl acid
Key Applications
High-sensitivity resistsE-beam & DUV lithographyThermally stable PAG
Electronic Grade (Low Metal Ion)
Photoacid Generators

Diaryliodonium Photoacid Generator I

SCP-PG-203

Chemistry Class
Diaryliodonium perfluoroalkanesulfonate
Key Applications
KrF / ArF lithographyControlled acid diffusionWide bake-window processes
Electronic Grade (Low Metal Ion)
Photoacid Generators

Cyclic Sulfonium Photoacid Generator I

SCP-PG-204

Chemistry Class
Aryl-tetrahydrothiophenium salt, fluoroether sulfonate anion
Key Applications
EUV patterningUltra-low acid diffusionStochastics / LWR control
Electronic Grade (Low Metal Ion)
Photoacid Generators

Cyclic Sulfonium Photoacid Generator II

SCP-PG-205

Chemistry Class
Oxathianium salt, bulky low-diffusion fluorinated anion
Key Applications
EUV resistsSub-20 nm half-pitch imagingDose-to-size stability
Electronic Grade (Low Metal Ion)
Photoacid Generators

Diaryliodonium Photoacid Generator II

SCP-PG-206

Chemistry Class
Bis(alkylaryl)iodonium arylsulfonate
Key Applications
Thick-film / packaging resistsi-line lithographyTuned acid strength
Electronic Grade (Low Metal Ion)
Photoacid Generators

Diazomethane-Type Photoacid Generator

SCP-PG-207

Chemistry Class
Bis(alkylsulfonyl)diazomethane (non-ionic)
Key Applications
KrF (248 nm) resistsNon-ionic, metal-free PAGClean profile control
Electronic Grade (Low Metal Ion)
Photoacid Generators

Diazonaphthoquinone Photosensitizer

SCP-PG-208

Chemistry Class
DNQ-sulfonate ester (dissolution-inhibitor type)
Key Applications
g-line / i-line positive resistsThick-film & bump lithographyDissolution inhibition
Electronic Grade (Low Metal Ion)

Photoresist Additives

7 products
Photoresist Additives

Trifunctional Thiocarbonyl Isocyanurate Additive

SCP-RA-301

Chemistry Class
Tris(oxathiolane-thione) isocyanurate
Key Applications
Adhesion promotionInterface engineeringResist stack additives
Electronic Grade (Low Metal Ion)
Photoresist Additives

Quaternary Ammonium Silicate Solution

SCP-RA-302

Chemistry Class
Metal-ion-free silicate, aqueous solution
Key Applications
Developer additivesSurface smoothingSpin-on dielectric chemistry
Electronic Grade (Metal-Ion-Free)
Photoresist Additives

Diaryl Benzoquinone Stabiliser

SCP-RA-303

Chemistry Class
Diaryl-substituted 1,4-quinone
Key Applications
Polymerisation inhibitionMonomer stabilisationElectron-transfer chemistry
Electronic Grade (High Purity)
Photoresist Additives

Isocyanurate Triacetic Acid

SCP-RA-304

Chemistry Class
Triazine-trione triacid
Key Applications
Crosslinker synthesisAdhesion chemistryChelating rinse formulations
Electronic Grade (High Purity)
Photoresist Additives

Aromatic Sulfonic Acid Catalyst

SCP-RA-305

Chemistry Class
Arylsulfonic acid monohydrate
Key Applications
Thermal acid generationBARC / crosslink catalysisElectronic-grade synthesis
Electronic Grade (Low Metal Ion)
Photoresist Additives

Tetra(methoxymethyl) Glycoluril Crosslinker

SCP-RA-306

Chemistry Class
Alkoxymethyl glycoluril (amino crosslinker)
Key Applications
Negative-tone resistsBARC / underlayer curingAcid-catalysed crosslinking
Electronic Grade (Low Metal Ion)
Photoresist Additives

Bisphenol Polyol Dissolution Modifier

SCP-RA-307

Chemistry Class
Multifunctional phenolic polyol
Key Applications
Dissolution-rate controlSensitivity enhancementEpoxy network cores
Electronic Grade (High Purity)
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