Semiconductor Materials
Fluorinated Tertiary-Alcohol Methacrylate
SCP-RM-101Hexafluoroalcohol (HFA)-functional methacrylateElectronic Grade (Low Metal Ion)
Electronic-grade fluoroalkyl building block engineered for high-resolution ArF and EUV photolithography. The hexafluoroalcohol motif delivers developer-switchable polarity, outstanding 193 nm transparency and an exceptionally low dielectric constant in advanced resist matrices.
Key applications
- ArF / EUV photoresist polymers
- Low-k dielectric materials
- High-transparency resist design
Specifications
- Product Code
- SCP-RM-101
- Chemistry Class
- Hexafluoroalcohol (HFA)-functional methacrylate
- Product Family
- Photoresist Monomers
- Product Line
- Semiconductor Materials
- Grade
- Electronic Grade (Low Metal Ion)
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
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