Semiconductor Materials
Tetra(methoxymethyl) Glycoluril Crosslinker
SCP-RA-306Alkoxymethyl glycoluril (amino crosslinker)Electronic Grade (Low Metal Ion)
Formaldehyde-efficient amino crosslinker for negative-tone resists, bottom anti-reflective coatings and spin-on underlayers. Cures at moderate bake temperatures with photogenerated or thermal acid, forming tight, optically transparent networks.
Key applications
- Negative-tone resists
- BARC / underlayer curing
- Acid-catalysed crosslinking
Specifications
- Product Code
- SCP-RA-306
- Chemistry Class
- Alkoxymethyl glycoluril (amino crosslinker)
- Product Family
- Photoresist Additives
- Product Line
- Semiconductor Materials
- Grade
- Electronic Grade (Low Metal Ion)
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
More in Semiconductor Materials
View allPhotoresist Monomers
Fluorinated Tertiary-Alcohol Methacrylate
SCP-RM-101
- Chemistry Class
- Hexafluoroalcohol (HFA)-functional methacrylate
- Key Applications
- ArF / EUV photoresist polymersLow-k dielectric materialsHigh-transparency resist design
Electronic Grade (Low Metal Ion)
Photoresist Monomers
Cyclic-Sulfonate Polar Methacrylate
SCP-RM-102
- Chemistry Class
- Oxathia-bicyclic sultone methacrylate
- Key Applications
- Chemically amplified resists (CAR)Adhesion & dissolution controlEtch-resistant resist matrices
Electronic Grade (Low Metal Ion)
Photoresist Monomers
Norbornane Fluoroalcohol Methacrylate I
SCP-RM-103
- Chemistry Class
- HFA-norbornyl methacrylate (compact tether)
- Key Applications
- ArF immersion lithographyEUV resist platformsLow line-edge-roughness (LER) design
Electronic Grade (Low Metal Ion)