Semiconductor Materials
Norbornane Fluoroalcohol Methacrylate I
SCP-RM-103HFA-norbornyl methacrylate (compact tether)Electronic Grade (Low Metal Ion)
Rigid bicyclic fluoro-monomer combining high carbon density for dry-etch resistance with an acidic fluoroalcohol group for alkaline developability. Designed for ArF immersion and EUV resist platforms where line-edge roughness is critical.
Key applications
- ArF immersion lithography
- EUV resist platforms
- Low line-edge-roughness (LER) design
Specifications
- Product Code
- SCP-RM-103
- Chemistry Class
- HFA-norbornyl methacrylate (compact tether)
- Product Family
- Photoresist Monomers
- Product Line
- Semiconductor Materials
- Grade
- Electronic Grade (Low Metal Ion)
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
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- Chemistry Class
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- Key Applications
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