Lithography Materials
High-purity monomers and intermediates for advanced photoresist systems.
Explore lineProduct portfolio
A focused catalogue of 26+ high-purity chemicals and intermediates, organised into 5 material families — from photoresist building blocks to CMP and cleaning chemistries.
High-purity monomers and intermediates for advanced photoresist systems.
Explore lineHigh-efficiency acid generators for chemically amplified resists.
Explore lineMonomers, crosslinkers and intermediates for reliable encapsulation.
Explore lineHigh-purity building blocks for next-generation displays.
Explore lineHigh-purity chemicals for CMP, cleaning, etching and conditioning.
Explore lineSpecialty monomers, photoacid generators and additives for photoresist formulation and fine-line patterning. Engineered for chemically amplified resists, advanced semiconductor R&D and next-generation lithography nodes.
Fluorinated Methacrylate Monomer
SCP-LM-101 · Short-chain fluoroalkyl methacrylate
Cycloaliphatic Fluoroalcohol Monomer
SCP-LM-102 · Fluorinated cycloaliphatic methacrylate
Acid-Labile Acetal Monomer
SCP-LM-103 · Protected (acid-cleavable) methacrylate
Custom Resist Monomers
SCP-LM-104 · Fluorinated & non-fluorinated, to specification
Iodonium and sulfonium photoacid generators with excellent thermal stability and high acid yield, designed for chemically amplified resists across DUV and ArF lithography.
Iodonium Photoacid Generator I
SCP-PG-201 · Diaryliodonium salt, low-diffusion anion
Iodonium Photoacid Generator II
SCP-PG-202 · Substituted diaryliodonium salt
Sulfonium Photoacid Generator I
SCP-PG-203 · Triarylsulfonium salt, high acid strength
Sulfonium Photoacid Generator II
SCP-PG-204 · Triarylsulfonium salt, low-diffusion anion
Imide-Type Photoacid Generator
SCP-PG-205 · N-sulfonyloxyimide (non-ionic)
High-performance monomers, crosslinkers, epoxy systems and coupling agents for advanced semiconductor packaging — enabling robust encapsulation, adhesion and moisture resistance.
Reactive Styrenic Intermediate
SCP-AP-301 · Functionalised styrenic monomer (isomer blend)
Para-Selective Styrenic Monomer
SCP-AP-302 · Functionalised styrenic monomer (single isomer)
Difunctional Aromatic Crosslinker
SCP-AP-303 · Divinyl aromatic monomer
Trifunctional Epoxy Crosslinker
SCP-AP-304 · Heterocyclic triepoxide
Multifunctional Epoxy Resin
SCP-AP-305 · Novolac-type epoxy
High-purity intermediates and building blocks for OLED emitter and transport layers, supporting efficient, stable and next-generation display devices.
Polyaromatic Aldehyde Intermediate
SCP-OL-401 · Fused-ring aromatic aldehyde
Acene Carboxylic Acid Intermediate
SCP-OL-402 · Fused-ring aromatic carboxylic acid
Heterocyclic Core Building Block
SCP-OL-403 · N-heterocyclic aromatic
Hole-Transport Material
SCP-OL-404 · Triarylamine type
Wide-Bandgap Host Material
SCP-OL-405 · Bipolar aromatic host
High-purity process chemicals and additives for CMP, cleaning, etching and surface conditioning — supporting critical front-end and back-end semiconductor manufacturing steps.
Metal-Ion-Free Alkaline Developer
SCP-PM-501 · Quaternary ammonium hydroxide solution
Silicate Etch & Smoothing Solution
SCP-PM-502 · Quaternary ammonium silicate solution
Electronic-Grade Oxidizer
SCP-PM-503 · Peroxide solution
Electronic-Grade Alkaline Cleaner
SCP-PM-504 · Ammonia solution
Copper Corrosion Inhibitor
SCP-PM-505 · Azole derivative
Tell us about your platform, target node and specifications. Our technical team will respond with the right grade, supply tier and documentation.