Semiconductor Materials
Cyclic Sulfonium Photoacid Generator II
SCP-PG-205Oxathianium salt, bulky low-diffusion fluorinated anionElectronic Grade (Low Metal Ion)
Advanced EUV-class PAG combining an oxygen-containing cyclic sulfonium cation with a sterically demanding fluorinated anion. Delivers exceptional diffusion control and dose-to-size stability for sub-20 nm half-pitch imaging.
Key applications
- EUV resists
- Sub-20 nm half-pitch imaging
- Dose-to-size stability
Specifications
- Product Code
- SCP-PG-205
- Chemistry Class
- Oxathianium salt, bulky low-diffusion fluorinated anion
- Product Family
- Photoacid Generators
- Product Line
- Semiconductor Materials
- Grade
- Electronic Grade (Low Metal Ion)
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
More in Semiconductor Materials
View allPhotoresist Monomers
Fluorinated Tertiary-Alcohol Methacrylate
SCP-RM-101
- Chemistry Class
- Hexafluoroalcohol (HFA)-functional methacrylate
- Key Applications
- ArF / EUV photoresist polymersLow-k dielectric materialsHigh-transparency resist design
Electronic Grade (Low Metal Ion)
Photoresist Monomers
Cyclic-Sulfonate Polar Methacrylate
SCP-RM-102
- Chemistry Class
- Oxathia-bicyclic sultone methacrylate
- Key Applications
- Chemically amplified resists (CAR)Adhesion & dissolution controlEtch-resistant resist matrices
Electronic Grade (Low Metal Ion)
Photoresist Monomers
Norbornane Fluoroalcohol Methacrylate I
SCP-RM-103
- Chemistry Class
- HFA-norbornyl methacrylate (compact tether)
- Key Applications
- ArF immersion lithographyEUV resist platformsLow line-edge-roughness (LER) design
Electronic Grade (Low Metal Ion)