Lithography Materials
Cycloaliphatic Fluoroalcohol Monomer
SCP-LM-102Fluorinated cycloaliphatic methacrylate
Rigid cycloaliphatic fluoro-monomer for high-resolution, etch-resistant resist platforms.
Key applications
- High-resolution resists
- Etch-resistant materials
- Next-generation lithography
Specifications
- Product Code
- SCP-LM-102
- Chemistry Class
- Fluorinated cycloaliphatic methacrylate
- Product Line
- Lithography Materials
- Grade
- High-purity, electronic grade
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
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