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SucopeiaSemicon Solutions

High-purity chemicals for CMP, cleaning, etching and conditioning.

Semiconductor Process Materials

High-purity process chemicals and additives for CMP, cleaning, etching and surface conditioning — supporting critical front-end and back-end semiconductor manufacturing steps.

High-purity chemicalsOptimized for processExcellent cleanliness & puritySupporting advanced manufacturing

6 products

Process
SCP-PM-501

Metal-Ion-Free Alkaline Developer

Quaternary ammonium hydroxide solution25% aqueous solution
Photoresist developmentSilicon etching
SCP-PM-502

Silicate Etch & Smoothing Solution

Quaternary ammonium silicate solution25% solution
EtchingSurface smoothing
SCP-PM-503

Electronic-Grade Oxidizer

Peroxide solution30% aqueous solution
CleaningRCA processes
SCP-PM-504

Electronic-Grade Alkaline Cleaner

Ammonia solution28% solution
Surface cleaningPhotoresist strip
SCP-PM-505

Copper Corrosion Inhibitor

Azole derivative
CMP additiveCopper corrosion inhibitor
SCP-PM-506

Chelating & Conditioning Agent

Organic acid (monohydrate)
Metal chelating agentSurface conditioning
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