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SucopeiaSemicon Solutions

High-purity monomers and intermediates for advanced photoresist systems.

Lithography Materials

Specialty monomers, photoacid generators and additives for photoresist formulation and fine-line patterning. Engineered for chemically amplified resists, advanced semiconductor R&D and next-generation lithography nodes.

High purity & consistent qualityExcellent chemical stabilityLow metal impuritiesSuitable for advanced lithography

Product families

Fluorinated MonomersPhotoacid Generators (PAG)Photoresist AdditivesSpecialty Intermediates

4 products

Lithography
SCP-LM-101

Fluorinated Methacrylate Monomer

Short-chain fluoroalkyl methacrylate
High-performance photoresistsLow dielectric constant materialsAdvanced lithography
SCP-LM-102

Cycloaliphatic Fluoroalcohol Monomer

Fluorinated cycloaliphatic methacrylate
High-resolution resistsEtch-resistant materialsNext-generation lithography
SCP-LM-103

Acid-Labile Acetal Monomer

Protected (acid-cleavable) methacrylate
Photoresist formulationAdhesion promoterProcess optimization
SCP-LM-104

Custom Resist Monomers

Fluorinated & non-fluorinated, to specification
Custom synthesis supportDesigned for specific applications
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Need something beyond our Lithography line?

We synthesise to specification and scale from samples to commercial supply. Share your requirements and our technical team will respond.

Request a Quoteinfo@sucopeiasemicon.com