Skip to content
SucopeiaSemicon Solutions

High-efficiency acid generators for chemically amplified resists.

Photoacid Generators (PAG)

Iodonium and sulfonium photoacid generators with excellent thermal stability and high acid yield, designed for chemically amplified resists across DUV and ArF lithography.

High efficiencyExcellent thermal stabilityHigh acid yieldDesigned for advanced lithography

5 products

PAG
SCP-PG-201

Iodonium Photoacid Generator I

Diaryliodonium salt, low-diffusion anion
Chemically amplified resists (CAR)Advanced lithography
SCP-PG-202

Iodonium Photoacid Generator II

Substituted diaryliodonium salt
High-sensitivity photoresistsDeep-UV lithography
SCP-PG-203

Sulfonium Photoacid Generator I

Triarylsulfonium salt, high acid strength
High acid yieldEtch-resistant materials
SCP-PG-204

Sulfonium Photoacid Generator II

Triarylsulfonium salt, low-diffusion anion
Photoresist formulationDUV & ArF lithography
SCP-PG-205

Imide-Type Photoacid Generator

N-sulfonyloxyimide (non-ionic)
Novel PAG chemistryHigh-sensitivity systems
Start a conversation

Need something beyond our PAG line?

We synthesise to specification and scale from samples to commercial supply. Share your requirements and our technical team will respond.

Request a Quoteinfo@sucopeiasemicon.com