Photoacid Generators (PAG)
Sulfonium Photoacid Generator II
SCP-PG-204Triarylsulfonium salt, low-diffusion anion
Sulfonium PAG for DUV and ArF photoresist formulation with controlled diffusion.
Key applications
- Photoresist formulation
- DUV & ArF lithography
Specifications
- Product Code
- SCP-PG-204
- Chemistry Class
- Triarylsulfonium salt, low-diffusion anion
- Product Line
- Photoacid Generators (PAG)
- Grade
- High-purity, electronic grade
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
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