Lithography Materials
Acid-Labile Acetal Monomer
SCP-LM-103Protected (acid-cleavable) methacrylate
Acid-labile monomer for chemically amplified resist formulation and adhesion control.
Key applications
- Photoresist formulation
- Adhesion promoter
- Process optimization
Specifications
- Product Code
- SCP-LM-103
- Chemistry Class
- Protected (acid-cleavable) methacrylate
- Product Line
- Lithography Materials
- Grade
- High-purity, electronic grade
Specifications are indicative. Full Certificate of Analysis and Safety Data Sheet are provided with every order.
Documentation provided
Certificate of Analysis (COA)Safety Data Sheet (SDS)Technical InformationBatch Traceability
More in Lithography Materials
View allSCP-LM-101
Fluorinated Methacrylate Monomer
Short-chain fluoroalkyl methacrylate
High-performance photoresistsLow dielectric constant materialsAdvanced lithography
SCP-LM-102
Cycloaliphatic Fluoroalcohol Monomer
Fluorinated cycloaliphatic methacrylate
High-resolution resistsEtch-resistant materialsNext-generation lithography
SCP-LM-104
Custom Resist Monomers
Fluorinated & non-fluorinated, to specification
Custom synthesis supportDesigned for specific applications